Substrate treatment system

作者: Henrik Obst

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摘要: A substrate treatment system for treating substrates in a continuous process includes chamber delimited by walls, having an entry lock and exit lock, also at least one device transportation inside the chamber. The has arrangement of rollers arranged behind other direction, vertical or horizontal substrates. rotor drive is under pressure conditions prevailing stator outside

参考文章(18)
Koichi Fujitani, Yokichi Hashimoto, Hidehiko Yamada, Takeshi Asano, Shuji Kimura, Roller tunnel kiln ,(1984)
Christopher Hofmeister, Alexander G. Krupyshev, Substrate processing apparatus with motors integral to chamber walls ,(2008)
Michael Hentschel, Steffen Lessmann, Ricky C. Powell, Reinhard Jaeger, Michael Huhn, Transporteinrichtung, insbesondere zum transport flächiger substrate durch eine beschichtungsanlage ,(2006)
Andreas Sauer, Harald Wurster, Edgar Haberkorn, Jürgen Henrich, Vaccum coating apparatus ,(2006)
Vivian Prof. Alberts, Udo Willkommen, Andreas Dutkowiak, Thomas Bock, Christian Brückner, Peter Linhart, Sebastian Müller, Christian Klenke, Method for diffusion treatment of workpiece, involves moving workpiece between sequent diffusion processes by transfer area arranged between reaction chambers ,(2008)