Evaluation of the Nanoimprinting Process Using Scanning Probe Microscopy (SPM)
作者： Makoto Okada , Shinji Matsui
DOI: 10.1007/978-3-642-25414-7_18
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摘要: Nanoimprint lithography (NIL) is a technology that allows the fabrication of low-cost nanostructure devices at high throughput and accuracy. The most popular NIL method ultraviolet (UV) nanoimprinting because it room-temperature process does not require thermal cycle. When demolding, force required result adhesion friction between antisticking layer resin, demolding produces pattern defects. Scanning probe microscopy (SPM) useful technique for evaluating performance nanometer scale both UV-curable resin. In this chapter, we describe evaluation, using techniques scanning microscopy, number properties layers resins used in nanoimprint lithography.
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