Maskless 2-D and 3-D pattern generation photolithography
作者： David P. Fries
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摘要: The present invention is a system and method to create two dimensional three structures using maskless photolithography that semi-automated, directly reconfigurable, does not require masks, templates or stencils each of the planes layers on multi layer two-dimensional structure. In an embodiment, uses micromirror array comprising up several million elements modulate light onto substrate has photoreactive photoresist compounds applied exposed surface. desired pattern designed stored conventional computer aided drawing techniques used control positioning individual mirrors in reflect corresponding pattern. Light impinging reflected directed away from dark spots according addition, fixture dimensions, for mounting allows be moved providing alignment two, coplanar dimensions capability produce by aligning third dimension perpendicular dimensions. easily reconfigurable rapid prototyping microscopic macroscopic devices.
lens.org 参考文章(111)
Kenneth C. Johnson, High-throughput, maskless lithography system ,(1999)
JoséR. Romero, Reverse-transcription polymerase chain reaction detection of the enteroviruses. Archives of Pathology & Laboratory Medicine. ,vol. 123, pp. 1161- 1169 ,(1999) , 10.5858/1999-123-1161-RTPCRD
Sangeet Singh-Gasson, Roland D. Green, Yongjian Yue, Clark Nelson, Fred Blattner, Michael R. Sussman, Franco Cerrina, Maskless fabrication of light-directed oligonucleotide microarrays using a digital micromirror array. Nature Biotechnology. ,vol. 17, pp. 974- 978 ,(1999) , 10.1038/13664
Akira Ishikawa, Maskless photolithography system that digitally shifts mask data responsive to alignment data ,(1999)
L.G. Mendoza, P. McQuary, A. Mongan, R. Gangadharan, S. Brignac, M. Eggers, High-Throughput Microarray-Based Enzyme-Linked Immunosorbent Assay (ELISA ) BioTechniques. ,vol. 27, pp. 778- 788 ,(1999) , 10.2144/99274RR01
Takashi Kanatake, Akira Ishikawa, Wenhui Mei, Moving exposure system and method for maskless lithography system ,(2000)
Rajesh Menon, Zone-Plate-Array Lithography (ZPAL): Simulations for system design X-RAY MICROSCOPY: Proceedings of the VI International Conference. ,vol. 507, pp. 647- 652 ,(2000) , 10.1063/1.1291225
Ichiro Tanaka, Yuichi Iwasaki, Makoto Ogusu, Kenji Tamamori, Yoshiyuki Sekine, Takahiro Matsumoto, Hiroshi Maehara, Ryusho Hirose, High precision binary optical element fabricated by novel self aligned process international microprocesses and nanotechnology conference. ,vol. 38, pp. 6976- 6980 ,(1999) , 10.1143/JJAP.38.6976
M. Robertsson, A. Dabek, G. Gustafsson, O.-J. Hagel, M. Popall, New patternable dielectric and optical materials for MCM-L/D- and o/e-MCM-packaging Proceedings. The First IEEE International Symposium on Polymeric Electronics Packaging, PEP '97 (Cat. No.97TH8268). pp. 203- 212 ,(1997) , 10.1109/PEP.1997.656491
Jeffrey M Hoffman, Thomas J. Dunn, Kanti Jain, Seamless, maskless lithography system using spatial light modulator ,(1996)