Monocrystalline test structures, and use for calibrating instruments

摘要: An improved test structure for measurement of width conductive lines formed on substrates as performed in semiconductor fabrication, and calibrating instruments such measurements, is from a monocrystalline starting material, having an insulative layer beneath its surface by ion implantation or the equivalent, leaving surface. The then processed preferential etching to accurately define components structure. substrate can be removed rear side form transparent window, that inspected transmissive-optical techniques. Measurements made using electrical optical techniques correlated with other including measurements scanning probe microscopy.