New technique for evaluation of surfaces and interfaces at atmospheric pressure by using Refracted X-ray Fluorescence (RXF)
作者： Yuji C. Sasaki , Kichinosuke Hirokawa
DOI: 10.1016/0169-4332(91)90090-7
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摘要: Abstract Refracted X-ray fluorescence (RXF) can evaluate thin films at atmospheric pressure. In this letter, we show the possibility of in-situ evaluation surfaces and interfaces in atmospheric-pressure metal-organic chemical vapor deposition (AP-MOCVD) phase epitaxy (AP-MOVPE) by using refracted technique. Evaluation pressure is illustrated an example evaporated metal films.
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