Photoresist compositions comprising itaconic anhydride polymers
作者： George G. Barclay , Michael J. Monaghan , Peter Trefonas
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摘要: Photoresists of the invention contain a resin that comprises itaconic anhydride units, but is substantially, essentially or completely free acid units. It has been found presence in resist component can significantly compromise resist's lithographic performance. Among other things, of itaconic compromises resolution developed relief image.
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