Processes for photolithography
作者： George G. Barclay , Deyan Wang , Kenneth J. Spizuoco , Thomas A. Estelle , Doris Kang
DOI:
关键词:
摘要: New lithographic processing methods are provided which particularly useful in immersion lithography schemes. In one aspect, processes of the invention comprise: applying on a substrate photoresist composition; exposing layer to radiation activating for removing portion but not all exposed layer; and developing treated provide relief image.
lens.org 参考文章(54)
Satoru Shimura, Tetsu Kawasaki, Hideharu Kyouda, Nobuhiro Takahashi, Exposure and developing method ,(2007)
Peter Trefonas, David C. Madoux, Anthony Zampini, Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol ,(1988)
Anthony Zampini, Aromatic novolak resins and blends ,(1990)
John D. Bruhnke, John G. Lever, Antireflective coatings comprising poly(oxyalkylene) colorants ,(1998)
Henricus Jozef Castelijns, Raymond Wilhelmus Louis Lafarre, Laurentius Johannes Adrianus Van Bokhoven, Nicolaas Ten Kate, Lithographic apparatus, coverplate and device manufacturing method ,(2010)
George G. Barclay, Michael J. Monaghan, Peter Trefonas, Photoresist compositions comprising itaconic anhydride polymers ,(1999)
George G. Barclay, Nicholas Pugliano, Negative photoresists for short wavelength imaging ,(2003)
Ching-Yu Chang, Photolithography material for immersion lithography processes ,(2010)
Robert J. Kavanagh, George G. Barclay, Zhibiao Mao, Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same ,(2003)