Photolithography material for immersion lithography processes
作者： Ching-Yu Chang
DOI:
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摘要: A photolithography material is provided. The a surface modifying material. includes polymer (e.g., fluorine polymer) that less than approximately 80% hydroxyl groups. In an embodiment, the fluoro-alcohol functional units. Methods of using include as additive to photoresist or topcoat layer. may be used in immersion lithography process.
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