Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same
作者： Robert J. Kavanagh , George G. Barclay , Zhibiao Mao
DOI:
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摘要: The present invention includes polymers and photoresist compositions that comprise the as a resin binder component. Photoresists of include chemically-amplified positive-acting resists can be effectively imaged at short wavelengths such sub-200 nm, particularly 193 nm. Polymers contain in specified molar ratios both nitrile photoacid labile groups have an alicyclic moiety, bridged bicyclic or tricyclic group other caged group. exhibit substantial resistance to plasma etchants.
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