Coating compositions for photoresists
作者： Deyan Wang , Michael K. Gallagher , Peter Trefonas
DOI:
关键词:
摘要: In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein predominant portion of component comprising or more resins are at least substantially free fluorine. Coating useful as photoresist overcoat layers, including in immersion lithography processing.
lens.org 参考文章(27)
Peter Trefonas, David C. Madoux, Anthony Zampini, Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol ,(1988)
Anthony Zampini, Aromatic novolak resins and blends ,(1990)
John D. Bruhnke, John G. Lever, Antireflective coatings comprising poly(oxyalkylene) colorants ,(1998)
George G. Barclay, Nicholas Pugliano, Negative photoresists for short wavelength imaging ,(2003)
Robert J. Kavanagh, George G. Barclay, Zhibiao Mao, Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same ,(2003)
Seung Chan Moon, Cheol Kyu Bok, Chang Moon Lim, Jae Chang Jung, Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same ,(2005)
Haruki Inabe, Shinichi Kanna, Hiromi Kanda, Protective film-forming composition for immersion exposure and pattern forming method using the same ,(2005)
Anthony Zampini, Alternating and block copolymer resins ,(1991)
Greg Breyta, James W. Thackeray, Ronald A. Dellaguardia, George G. Barclay, Hiroshi Ito, Michael F. Cronin, Copolymers and photoresist compositions comprising copolymer resin binder component ,(1997)