Coating compositions for photolithography
作者： Anthony Zampini , Owendi Ongayi , Michael K. Gallagher
DOI:
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摘要: In a first aspect, methods are provided that comprise: (a) applying curable composition on substrate; (b) hardmask above the composition; (c) photoresist layer hard mask composition, wherein one or more of compositions removed in an ash-free process. second comprise organic comprises material produce alkaline-soluble group upon thermal and/or radiation treatment. Related also provided.
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