Plasma immersion ion milling apparatus and method

摘要: Disclosed is an apparatus and method for low-temperature plasma immersion processing of a variety workpieces using accelerated ions, wherein distributed around cylindrical workpiece placed in chamber, the enclosed with housing including multi-slot extracting electrode to isolate from plasma, negative potential sufficient induce sputtering applied electrode, so that ions are within sheath formed between pass through slot part bombard workpiece, thus polishing surface workpiece. This effective smoothing ones nm large substrates particularly micro or nanopattern transfer. includes cleaning, activating, smoothing, dry etching, deposition, ion implantation deposition single multi chamber.