The future prospect of nonvolatile memory

作者: Kinam Kim , Jung Hyuk Choi , Jungdal Choi , Hong-Sik Jeong

DOI: 10.1109/VTSA.2005.1497091

关键词:

摘要: As mobile appliances are prevailing in our daily lives, the nonvolatile memory suitable for applications becomes indispensable elements and it is anticipated that usage much increased future due to diversified applications. Therefore very appropriate important look into where technologies now, what challenges are, should go. In this study, two major devices of i.e., NAND flash NOR reviewed then newly emerging PRAM (phase change memory), FRAM (ferroelectric memory) discussed.

参考文章(3)
H.J. Joo, Y.J. Song, H.H. Kim, S.K. Kang, J.H. Park, Y.M. Kang, E.Y. Kang, S.Y. Lee, H.S. Jeong, Kinam Kim, Highly reliable and mass-productive FRAM embedded smartcard using advanced integration technologies symposium on vlsi technology. pp. 148- 149 ,(2004) , 10.1109/VLSIT.2004.1345445
W.H. Lee, Dong-Kyu Lee, Young-Ho Na, Keon-Soo Kim, Kun-Ok Ahn, Kang-Deog Suh, Yonghan Roh, Impact of floating gate dry etching on erase characteristics in NOR flash memory IEEE Electron Device Letters. ,vol. 23, pp. 476- 478 ,(2002) , 10.1109/LED.2002.801305
S. Mori, E. Sakagami, H. Araki, Y. Kaneko, K. Narita, Y. Ohshima, N. Arai, K. Yoshikawa, ONO inter-poly dielectric scaling for nonvolatile memory applications IEEE Transactions on Electron Devices. ,vol. 38, pp. 386- 391 ,(1991) , 10.1109/16.69921