Enlarged contact area structure using noble metal cap and noble metal liner
作者： Yang Chih-Chao , Kelly James J , Motoyama Koichi , Peethala Cornelius Brown
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摘要: A method is presented for forming an enlarged contact area. The includes a trench receiving first conductive material, noble metal cap over portion of the dielectric capping layer cap, etching material to create via anchoring structure and undercut region exposing bottom surface depositing plurality liners such that one liner directly contacts entirety exposed cap.
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