Simultaneous discharge apparatus

摘要: There is provided a simultaneous discharge apparatus comprising plurality of plasma treatment apparatuses and single high-frequency power supply, in which the are discharged simultaneously using being coil electrode used as an for generating inductive coupled mainly generated, wherein supply line from branched into each through branch section, fixed capacitor on downstream side section between apparatus. It preferable to adjust impedance be 2.3-2.7 times that located same side. With this, it possible conduct such etching process or ashing coating film formed surface material treated chamber at rate.