Cliché fabrication method using precise roll printing process with 5 um pattern width

摘要: Among the printing processes for printed electronic devices, gravure offset and reverse method have drawn attention its fine pattern possibility. These methods use cliche, which has critical effect on final product precision quality. In this research, a novel precise cliche replica is proposed. It consists of copper sputtering, mask with 5 um width using printing, Ni electroplating, lift-off, etching, DLC coating. We finally compare fabricated original one print out patterns cliche.