Method for etching etching target layer
作者： Yoshiki Igarashi , Hiroshi Okada , Shin Hirotsu , Tomonori Miwa
DOI:
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摘要: Disclosed is an etching method for target layer. The includes: a first step of depositing plasma reaction product on mask layer made organic film formed the layer; and after step, second includes coarse region in which plurality openings are formed, dense surrounding region. exists more densely than positioned close to compared In method, width becomes narrower
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