Patterning of antistiction films for electromechanical systems devices
作者： Teruo Sasagawa
DOI:
关键词:
摘要: A laser absorption layer is first selectively formed in a seal pattern region surrounding an array of electromechanical systems elements, followed by depositing antistiction as blanket over the substrate and layer. The then removed from using laser. An epoxy sealing material provided where was backplate sealed to epoxy.
lens.org 参考文章(15)
Brian J. Gally, William J. Cummings, Process for modifying offset voltage characteristics of an interferometric modulator ,(2005)
S.E. Kirkwood, M.R. Shadnam, R. Fedosejevs, A. Amirfazli, Direct writing of self-assembled monolayers on gold coated substrates using a CW argon laser international conference on mems, nano, and smart systems. pp. 48- 52 ,(2003) , 10.1109/ICMENS.2003.1221963
Andrew G. Huibers, Satyadev R. Patel, Spatial light modulators with light blocking/absorbing areas ,(2002)
Yasufumi Yamada, Katsumi Midorikawa, Hiroshi Kumagai, Method and apparatus for processing three-dimensional structure, method for producing three-dimensional shape product and three-dimensional structure ,(2002)
Mark W. Miles, Photonic mems and structures ,(2006)
Paul Felice Reboa, Chien-Hua Chen, Charles C. Haluzak, Microelectromechanical system device and method for preparing the same for subsequent processing ,(2006)
Shaoher X. Pan, Vlad Novotny, Wafer-level packaging of micro devices ,(2006)
Kimura Yukihiro, Iwai Yasuhiko, LASER BEAM MACHINING METHOD ,(1991)
Ki-deok Bae, Yong-seop Yoon, Method of fabricating anti-stiction micromachined structures ,(2001)