Electrodeposition of CoWP Film I. Electrochemical and Compositional Analyses

摘要: Electrochemical characterization of electrodeposition CoWP films on copper substrate from a citrate electrolyte was carried out using voltammetry and chronoamperometry techniques. The experiments revealed that codeposition cobalt, tungsten, phosphorus an containing cobalt sulfate, sodium tungstate, hypophosphite, tri-sodium occurred via nucleation process under mass-transfer control. chronoamperometric study showed instantaneous mechanism during electrocrystallization copper. Finally, bath developed which thin were deposited at room temperature copper-coated silicon wafers. Surface analysis X-ray photoelectron spectroscopy the contained elemental phosphorus, hydroxide oxides tungsten. Scanning electron microscopy atomic force images had typical spherical nodular structures with good uniformity dense coverage.