Growth model for plasma-CVD growth of carbon nano-tubes on Ni-sheets
DOI: 10.1016/J.DIAMOND.2006.07.005
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摘要: The plasma enhanced chemical vapor deposition (PECVD) of carbon nano-tubes (CNT) on nickel sheets is considered as efficient production method great technologically interest. Different morphologies CNT Ni-sheets can be achieved by a variation the process parameters, like partial pressure acetylene and ammoniac inlet gas mixture, total pressure, temperature. results are summarized in detailed growth model based thermodynamic considerations. conclusion from this that single-wall (SWCNT), which more desirable than multi wall variants (MWCNT) or graphite nano-fibers (GNF), requires fastest reaction velocity for formation. PECVD supports formation, but enhancement additional inhibitors required.
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