作者: N. Nakanishi , K. Kusakabe , T. Yamazaki , K. Ohkawa , I. Hashimoto
DOI: 10.1016/J.PHYSB.2005.12.134
关键词:
摘要: A systematic structural analysis of a-plane InGaN/GaN was performed using electron diffraction, high-resolution transmission microscopy (HRTEM), and energy-dispersive X-ray spectroscopy. From the results local Fourier diffractograms HRTEM images, it found that exhibits coherent epitaxial growth a slight tilt direction between GaN InGaN layers. Furthermore, In concentration angle increase simultaneously with increasing distance from interface.