Effects of Ar gas pressure on microstructure of DLC films deposited by high-power pulsed magnetron sputtering

作者: Setsuo Nakao , Ken Yukimura , Hisato Ogiso , Shizuka Nakano , Tsutomu Sonoda

DOI: 10.1016/J.VACUUM.2012.07.004

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摘要: Abstract Diamond-like carbon (DLC) films are prepared on Si substrates by a high-power pulsed magnetron sputtering and the microstructure is examined using Raman spectroscopy as function of Ar gas pressure in range 0.11–0.52 Pa. Compositional analysis also carried out Rutherford backscattering spectrometry (RBS) elastic recoil detection (ERDA). In spectra, disorder ( D ) graphite G peaks observed at around 1370 1580 cm −1 , respectively, for all samples. The parameters, intensity ratio peak to I )/ )), position full width half maximum (FWHM) peak, obtained fitting Gaussian function. decreases from 3.84 3.32 with increasing up 0.3 Pa. At further increase pressure, it nearly constant 3.3, indicating sp 2 cluster size not changes. addition, 1584 1571 cm FWHM increases 125 144 cm These results suggest that disordering enhanced However, shifts 1578 cm suggesting clusters amount. Ion beam reveals density 1.66 2.03 g/cm 3 0.3 Pa 1.79 g/cm higher than H concentration 10 14.9 at% more densification DLC proceeds varying 0.3 Pa, but suppressed possibly due pressure. current experiments, may be suitable phase less clustering, relating C–C configuration films.

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