Investigating the structural and physical properties of hydrogenated amorphous carbon films fabricated by middle frequency pulsed unbalanced magnetron sputtering
作者： H.Y. Dai , Y.Q. Zhang , Z.P. Chen , F.X. Zhai
DOI: 10.1016/J.PHYSB.2013.12.045
关键词:
摘要: Abstract Hydrogenated amorphous carbon (a-C:H) films were deposited by the middle frequency pulsed magnetron sputtering method using a graphite target in mixed methane and argon plasma. The effects of substrate bias on microstructure, surface morphology, mechanical, electrical optical properties a-C:H investigated. It has been found that sp 3 fraction increases with increasing from 0 to 150 V. AFM measurements show RMS roughness decreases correlation between is revealed, mechanism it suggested this paper. Nanoindentation, indicate nanohardness, resistivity band gap increase results above are useful for practical application films.
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