Controlling the growth of particle size and size distribution of silica nanoparticles by the thin film structure

摘要: Nanostructured silicondioxide thin films were prepared by sol–gel spin coating technique. The SiO2 made using a conventional mixture of tetraethoxysilane (TEOS), deionized water and ethanol with various NH3/TEOS ratios. nanostructured silica the sol regular to control enlargement particles inside films. structural, morphological optical characterizations as-deposited annealed carried out X-ray diffraction (XRD), atomic force microscopy, scanning electron NKD spectrophotometer ultraviolet–visible (UV–vis) spectroscopy. transmittance data infrared spectra recorded an FT-IR Spectrometer. XRD studies showed that amorphous formation alfa-cristobalite phase film was investigated at annealing temperature close 1,100 °C. Optical properties in s p-polarization modes collected. Refractive indices extinction coefficients determined respect ratios compositions cut-off wavelength values from extrapolation absorbance which estimated UV–vis spectroscopy measurements. A red shift absorption threshold indicated size nanoparticles increased increase volume ratio 1:64 1:8.