Simultaneous removal of ammonia and nitrate by coupled S0-driven autotrophic denitrification and Anammox process in fluorine-containing semiconductor wastewater.
作者： Xiang Li , Yan Yuan , Yong Huang , Zhen Bi
DOI: 10.1016/J.SCITOTENV.2019.01.164
关键词:
摘要: Abstract To achieve the simultaneous removal of NH4+-N and NO3−-N in F−-containing semiconductor wastewater by coupled S0-driven autotrophic denitrification Anammox process, effect variable F− concentration on process was investigated batch experiments. The denitrifying ammonium oxidation (Deamox) reactor then started-up to explore feasibility coupling sulfur (SADN) for treatment wastewater. Short-term variation has an obviously activity sludge, but didn't affect nitrogen conversion rate. decreased after long-term operation Deamox when influent concentrations reached 552 mg/L. sensitivity bacteria is stronger than that SADN bacteria. Total efficiency 98% total rate 4.11 kg/(m3·d) were achieved reactor, pre-treated calcium ions. Moreover, high-throughput 16S rRNA gene sequence analysis indicated could influence structure functional microbial communities process. Candidatus Kuenenia, Thiobacillus Sulfurimonas main symbiotic.
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