Fast model-based optical proximity correction

摘要: An efficient method and system is provided for computing lithographic images that takes into account vector effects such as lens birefringence, resist stack tailored source polarizations, may also include blur of the mask resist. These are included by forming a generalized bilinear kernel, which independent transmission function, can then be treated using decomposition to allow rapid computation an image includes non-scalar effects. Dominant eigenfunctions kernel used pre-compute convolutions with possible polygon sectors. A function decomposed sectors, weighted pre-images formed from coherent sum pre-computed appropriate The at point incoherent over all dominant kernel. resulting perform model-based optical proximity correction (MBOPC).