Harmonic resist model for use in a lithographic apparatus and a device manufacturing method
作者： Wenjin Shao , Yu Cao , Antoine Jean Bruguier , Luoqi Chen
DOI:
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摘要: A method for determining an image of a mask pattern in resist coated on substrate, the including aerial at substrate level; and convolving with least two orthogonal convolution kernels to determine that is representative resist.
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