Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same
作者： Kars Zeger Troost , Johannes Jacobus Matheus Baselmans , Karel Diederick Van Der Mast
DOI:
关键词: Kernel (image processing) 、 Aerial image 、 Artificial intelligence 、 Optical proximity correction 、 Lithography 、 Computer science 、 Grayscale 、 Computer vision 、 Iterative and incremental development 、 Computer program
摘要: Grayscale Optical Proximity Correction device features are added to a mask pattern by convoluting the with two-dimensional correction kernel or two one-dimensional kernels generate grayscale OPC features. The resulting may be used in projection lithography apparatus having programmable patterning means that is adapted three more intensity levels. An iterative process of simulating an aerial image would produced pattern, comparing simulation desired and adjusting optimum for projection.
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