System and method for generating pattern data used to control a pattern generator
作者： Arno Jan Bleeker , Azat M. Latypov , Kars Zeger Troost , Jang Fung Chen
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摘要: A method and system are used to modify pattern data obtained in relation a on static patterning device. It is suggested that, an example when maskless lithography tool used, continuous OPC-enhanced features for rasterization should include variation local amplitude phase transmittance that matches modulation capabilities of device being used. The modified by dynamic impinging light, which then projected onto object. comprise using generating device, modification generator, projection system. generates corresponding receives the modifies characteristics type generator patterned uses beam radiation. projects
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