Method of data encoding, compression, and transmission enabling maskless lithography

摘要: A method and tool for conducting charged-particle beam direct write lithography is disclosed. disclosed involves condensing an initial design file down to a set of profiles pattern relative locations form formatted file. The adjusted accommodate desired corrections. Portions the records are extracted data strips that have plurality channels with spatial indicators. Data sequentially read construct printable indicators specify profiles. Additionally, printed from each strip onto substrate on substrate.