Sensitisation of erbium luminescence in erbium-implanted alumina
作者： A.J. Kenyon , C.E. Chryssou , T.M. Smeeton , C.J. Humphreys , D.E. Hole
DOI: 10.1016/J.OPTMAT.2005.09.052
关键词:
摘要: Abstract Experimental evidence of an efficient broadband sensitisation mechanism in erbium-implanted alumina is presented. Alumina thin films were deposited by plasma-enhanced chemical vapour deposition. The as-grown implanted with erbium. Photoluminescence excitation spectra showed that exhibit 1.53 μm luminescence even when pumped at wavelengths outside Er 3+ absorption bands. samples analysed structurally using transmission electron microscopy and energy loss spectroscopy. We postulate the sensitising species either small nanoclusters aluminium or pairs ions, though possibility defect-mediated cannot be conclusively ruled out this stage.
harvard.edu
elsevier.com
sci-hub.se 参考文章(18)
C.E. Chryssou, C.W. Pitt, D.E. Hole, P.J. Chandler, Photoluminescence characterisation of Er3+/Yb3+ co-implanted alumina (Al2O3) thin films and sapphire crystals IEE Proceedings - Optoelectronics. ,vol. 145, pp. 325- 330 ,(1998) , 10.1049/IP-OPT:19982477
S. Musa, H.J. van Weerden, T.H. Yau, P.V. Lambeck, Characteristics of Er-doped Al/sub 2/O/sub 3/ thin films deposited by reactive co-sputtering IEEE Journal of Quantum Electronics. ,vol. 36, pp. 1089- 1097 ,(2000) , 10.1109/3.863962
Mark Sceats, Optical Fibre Communications telecommunications forum. pp. 191- ,(1999)
T. Kitagawa, K. Hattori, M. Shimizu, Y. Ohmori, M. Kobayashi, Guided-wave laser based on erbium-doped silica planar lightwave circuit Electronics Letters. ,vol. 27, pp. 334- 335 ,(1991) , 10.1049/EL:19910211
C.E. Chryssou, C.W. Pitt, Er/sup 3+/-doped Al/sub 2/O/sub 3/ thin films by plasma-enhanced chemical vapor deposition (PECVD) exhibiting a 55-nm optical bandwidth IEEE Journal of Quantum Electronics. ,vol. 34, pp. 282- 285 ,(1998) , 10.1109/3.658711
AJ Kenyon, CE Chryssou, CW Pitt, T Shimizu-Iwayama, DE Hole, N Sharma, CJ Humphreys, None, Luminescence from erbium-doped silicon nanocrystals in silica: Excitation mechanisms Journal of Applied Physics. ,vol. 91, pp. 367- 374 ,(2002) , 10.1063/1.1419210
Francesco Priolo, Giorgia Franzò, Salvatore Coffa, Alberto Carnera, Excitation and nonradiative deexcitation processes of Er 3 + in crystalline Si Physical Review B. ,vol. 57, pp. 4443- 4455 ,(1998) , 10.1103/PHYSREVB.57.4443
C. Strohhöfer, A. Polman, Silver as a sensitizer for erbium Applied Physics Letters. ,vol. 81, pp. 1414- 1416 ,(2002) , 10.1063/1.1499509
Albert Polman, Frank C. J. M. van Veggel, Broadband sensitizers for erbium-doped planar optical amplifiers: review Journal of The Optical Society of America B-optical Physics. ,vol. 21, pp. 871- 892 ,(2004) , 10.1364/JOSAB.21.000871
A J Kenyon, P F Trwoga, M Federighi, C W Pitt, OPTICAL-PROPERTIES OF PECVD ERBIUM-DOPED SILICON-RICH SILICA - EVIDENCE FOR ENERGY-TRANSFER BETWEEN SILICON MICROCLUSTERS AND ERBIUM IONS Journal of Physics: Condensed Matter. ,vol. 6, ,(1994) , 10.1088/0953-8984/6/21/007