Magnetic pole fabrication process and device
作者： Boris Kobrin , Edward Ostan
DOI:
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摘要: A method and apparatus for fabricating an electroplating mask the formation of a miniature magnetic pole tip structure. The incorporates silylation process to silylate photoresist after creating cavity or trench (60) in mask. is performed dry etch photoresist. Alternatively, lithographic patterning trench. As result chemical biasing, vertical side walls (62, 64) layer shift inward narrower resulting structure (65) formed has width less than 0.3 micrometers. This can be used as thin film head ('TFH') data storage device.
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