作者: Milan Perný , Miroslav Mikolášek , Vladimír Šály , Michal Ružinský , Vladimír Ďurman
DOI: 10.1016/J.APSUSC.2012.09.086
关键词:
摘要: Abstract Amorphous silicon carbide a-SiC (or more accurate a-Si 1− x C ) thin films were prepared within Au/a-Si /c-Si(p)/Al structures by PECVD deposition technique. Thin on (1 0 0) substrates deposited using two different RF modes, i.e. placing the either electrically powered or grounded electrode. FTIR spectroscopy method was used for characterization of chemical bond states in structure. Morphology surface analysed AFM. – V measurements heterostructures performed to evaluate charge transport properties structures. Temperature dependences forward (FW) current–voltage ( I characteristics are shown and this paper. Parameters as saturation current activation energies calculated from biased curves.