SUBSTRATE TREATING EQUIPMENT

作者: Maeda Tokuo , Ono Masao , Ki Kannan , Washimi Koji , Matsumoto Takao

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摘要: PROBLEM TO BE SOLVED: To provide a substrate treating equipment which is simplified in constitution and reduced size the flow velocity of fluid section corresponding to central part sufficiently made faster. SOLUTION: The constituted such way that long first tubular body 2 extended arranging direction substrates 5 state where faces centers vicinity bottom an overflow tank 1 has discharge port from liquid discharged downward adopted as supplying having outward protruding space 1a so surround prescribed extent including 1. width narrower.

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