Apparatus for and method of processing substrate
作者： Atsushi Osawa , Yoshitaka Abiko
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摘要: A substrate processing apparatus discharges a hydrofluoric acid solution from discharge nozzles toward grooves formed in side walls of an inner bath. The discharged the impinges upon to diffuse, thereby moving top portion bath form low-speed uniform liquid flows. Thus, metal component and foreign substances generated float up without being agitated within bath, are rapidly drained outer together with solution.
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