SUBSTRATE TREATING DEVICE

作者: Nakazawa Makoto , Yuasa Satoshi , Matsumura Yoshitaka

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摘要: PURPOSE:To provide a substrate treating device with the dead time in handling reduced and throughput increased. CONSTITUTION:This is provided chamber 4 for 2, two cassettes 14a 14b capable of respectively housing plural substrates an air-lock vessel 30 divided by central partition 32 into chambers 14b, driving mechanism 36 lifting rotating 30, connecting 42 forming 46 half side when raised packing 44 vacuum-sealing 42.

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