Liquid processing device
作者： Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Norihiro Itoh , 新藤 尚樹
DOI:
关键词:
摘要: A liquid processing device is equipped with: a substrate-holding part (21) that holds substrate (W) horizontally and rotates the substrate; nozzles (82) supply with respect to being held by part; cup (40) provided outside of peripheral edge part, receives after it has been supplied nozzles; top plate (32) covers from above rotational drive mechanism plate; liquid-receiving member (130) having an annular space (132) which encloses plate.
lens.org 参考文章(18)
Hiromi Kiyose, 浩巳 清瀬, Apparatus and method for substrate treatment ,(2000)
Hiroichi Inada, 博一 稲田, 伸一 林, Shinichi Hayashi, Application device and method ,(2000)
浩之 荒木, Hiroyuki Araki, Device and method for treating substrate ,(2003)
Kiyohisa Tateyama, Kimio Motoda, 清久 立山, 公男 元田, Liquid treatment system ,(1998)
Kobayashi Hiroshi, Matsunaga Sanenobu, ROTARY SUBSTRATE COATER ,(1997)
Yamazaki Takeshi, SUBSTRATE TREATMENT APPARATUS AND WASHING METHOD ,(2004)
Nakazawa Makoto, Yuasa Satoshi, Matsumura Yoshitaka, SUBSTRATE TREATING DEVICE ,(1993)
Yuji Kamikawa, 裕二 上川, Solution processing apparatus ,(2000)
Furue Takahiro, Tateda Naruhiko, Substrate processing apparatus and substrate processing method ,(2013)