SUBSTRATE TREATMENT APPARATUS AND WASHING METHOD

摘要: PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus and washing method whereby container such as cup lid for opening closing the can be positively washed load of operation reduced. SOLUTION: A rotary 50 rotates at predetermined rotational speed, so that cleaning solution 21 stored in storage tank 52 flows to outside due centrifugal force. The is discharged upward it from hole 52a by flowing Since diagonally formed, diagonal direction. Thus, reach region around outer side G body 37 (a on right broken line indicated reference character A). COPYRIGHT: (C)2004,JPO&NCIPI