System and method for controlling concentration of polishing solution to be stable
作者： Jin Yinuo , Wang Jian , Wang Hui
DOI:
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摘要: The invention discloses a system and method for controlling the concentration of polishing solution to be stable. comprises storage tank, controller, detection device, liquid circulation control an electroplating discharge device supply wherein detects metal ion acid radical in tank sends information controller; conveys reaction, back tank; is used reaction; discharges supplements stock received are compared with set value through commands sent according comparative results, so that adjusted reach values.
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