Influence of thermal annealing on optical properties and structure of aluminium oxide thin films by filtered cathodic vacuum arc

摘要: Abstract Optical and structural properties of aluminium oxide thin films are investigated in the annealing temperature range 200–900 °C. The changes optical film structure show great dependence on temperature. For annealed at low temperatures (from 200 °C to 600 °C), properties, such as transmittance constants, could be improved by thermal with amorphous smooth surface. However, for higher (e.g. 900 °C), poor performance indicates undesirable application precise use optics due significant both surface roughness. At optimum 600 °C, reach high that substrate possesses better constants (refractive index was 1.73 extinction coefficient ∼10−4 550 nm) remaining