Photonics For Integrated Circuits And Communications

摘要: This paper reviews recent progress in the development of integrated optical circuits involving GaAs/AfGaAs double heterostructure system. Devices utilizing periodic corrugations or gratings are considered briefly, whereas alternative attempts to fabricate by chemical etching discussed detail. The InGaAsP/InP system is also considered. Recent advances processing techniques for integration, including reactive ion etching, described, along with measurements that correlate waveguide loss epitaxial layer uniformity.