Plasma Sheath Formation by RF Fields.

摘要: Abstract : It has been observed that the application of a radio-frequency voltage (10 kc/s - 50 Mc/s) to any one several electrode configurations around outside plasma discharge tube results in constriction luminous portion away from inner walls glass tube. This investigation established phenomenon is result an interaction between externally applied rf and which leads formation dc positive ion sheath. The physical mechanism by occurs basically rectification. current flowing can be represented as resultant two voltage-dependent sources, relating probe characteristic plasma, other movement body electrons toward wall. There must no average net wall insulator. described terms differential equation whose solution shown fit qualitatively all general characteristics with regard its dependence on arc current. most form was solved numerically experimental observations quantitatively for both square sine wave inputs. (Author)