作者: Bao Jun Yan , Shu Lin Liu , Lu Ping Yang
DOI: 10.4028/WWW.SCIENTIFIC.NET/AMR.1096.93
关键词:
摘要: Oxide thin films such as aluminum oxide doped with zinc (AZO), and (Al2O3) were prepared in the pores of microchannel plate (MCP) by atomic layer deposition (ALD), which is a precise control film thickness on substrate high aspect ratio structure. In this paper, homogenous deposited varied substrates ALD technology under different conditions, morphology, element distribution structure samples are systematically investigated scanning electron microscopy (SEM), energy dispersive x-ray (EDX), diffraction (XRD) respectively, The results show that technique good method to grow MCP.