Design Space Analysis for Cross-Point 1S1MTJ MRAM: Selector–MTJ Cooptimization

作者: Hung-Li Chiang , Tzu-Chiang Chen , Ming-Yuan Song , Yu-Sheng Chen , Jung-Piao Chiu

DOI: 10.1109/TED.2020.3005118

关键词:

摘要: To increase the density of magnetoresistive random access memory (MRAM) beyond 1T1MTJ MRAM cell in use today, design space for 1S1MTJ array is analyzed by cooptimizing both selectors and MTJs. Current low-resistance MTJs are not suitable MRAM. Threshold-type would induce a strong read disturb on MTJ due to snapback voltage ( ${V}_{\mathrm {TH}}$ – {HOLD}}$ ) when selector turned on. Also, exponential-type degrade margin (RM) its large ON-state resistance. When using existing achieve 1-M-bit array, it necessary adjust product resistance area (RA) diameter MTJ. An with RA $= 15\,\,\Omega \cdot \mu \text{m}^{2}$ = 50 nm can meet criterion RM > 10% (exponential slope 300–500 mV/decade current ~ 1 MA/cm2) threshold-type {HOLD}} \sim ~250$ mV). A accommodating variation around 1% be found tunnel magnetoresistance ratio (TMR) < 250%. With an increased TMR 250%–350% MTJ, tolerance variations improved 2% 4%, respectively. This provides chance selectors.

参考文章(27)
Jiun-Jia Huang, Yi-Ming Tseng, Chung-Wei Hsu, Tuo-Hung Hou, Bipolar Nonlinear $\hbox{Ni/TiO}_{2}\hbox{/}\hbox{Ni}$ Selector for 1S1R Crossbar Array Applications IEEE Electron Device Letters. ,vol. 32, pp. 1427- 1429 ,(2011) , 10.1109/LED.2011.2161601
Kangho Lee, Seung H. Kang, Development of Embedded STT-MRAM for Mobile System-on-Chips IEEE Transactions on Magnetics. ,vol. 47, pp. 131- 136 ,(2011) , 10.1109/TMAG.2010.2075920
Leqi Zhang, Bogdan Govoreanu, Augusto Redolfi, Davide Crotti, Hubert Hody, Vasile Paraschiv, Stefan Cosemans, Christoph Adelmann, Thomas Witters, Sergiu Clima, Yang-Yin Chen, Paul Hendrickx, Dirk J Wouters, Guido Groeseneken, Malgorzata Jurczak, None, High-drive current (>1MA/cm 2 ) and highly nonlinear (>10 3 ) TiN/amorphous-Silicon/TiN scalable bidirectional selector with excellent reliability and its variability impact on the 1S1R array performance international electron devices meeting. ,(2014) , 10.1109/IEDM.2014.7047000
VSS Srinivasan, S Chopra, P Karkare, P Bafna, S Lashkare, P Kumbhare, Y Kim, S Srinivasan, S Kuppurao, S Lodha, Udayan Ganguly, None, Punchthrough-Diode-Based Bipolar RRAM Selector by Si Epitaxy IEEE Electron Device Letters. ,vol. 33, pp. 1396- 1398 ,(2012) , 10.1109/LED.2012.2209394
Hiroyuki Akinaga, Hisashi Shima, Resistive Random Access Memory (ReRAM) Based on Metal Oxides Proceedings of the IEEE. ,vol. 98, pp. 2237- 2251 ,(2010) , 10.1109/JPROC.2010.2070830
K.-T. Nam, S. C. Oh, J. E. Lee, J. H. Jeong, I. G. Baek, E. K. Yim, J. S. Zhao, S. O. Park, H. S. Kim, U-In Chung, J. T. Moon, Switching Properties in Spin Transper Torque MRAM with sub-5Onm MTJ size non-volatile memory technology symposium. pp. 49- 51 ,(2006) , 10.1109/NVMT.2006.378875
Jiyong Woo, Jeonghwan Song, Kibong Moon, Ji Hyun Lee, Euijun Cha, Amit Prakash, Daeseok Lee, Sangheon Lee, Jaesung Park, Yunmo Koo, Chan Gyung Park, Hyunsang Hwang, Electrical and reliability characteristics of a scaled (∼30nm) tunnel barrier selector (W/Ta 2 O 5 /TaO x /TiO 2 /TiN) with excellent performance (J MAX > 10 7 A/cm 2 ) symposium on vlsi technology. pp. 1- 2 ,(2014) , 10.1109/VLSIT.2014.6894431
A V Khvalkovskiy, D Apalkov, S Watts, R Chepulskii, R S Beach, A Ong, X Tang, A Driskill-Smith, W H Butler, P B Visscher, D Lottis, E Chen, V Nikitin, M Krounbi, Erratum: Basic principles of STT-MRAM cell operation in memory arrays Journal of Physics D. ,vol. 46, pp. 139601- ,(2013) , 10.1088/0022-3727/46/13/139601
G. Servalli, A 45nm generation Phase Change Memory technology international electron devices meeting. pp. 1- 4 ,(2009) , 10.1109/IEDM.2009.5424409