Soft Ultraviolet (UV) Photopatterning and Metallization of Self-Assembled Monolayers (SAMs) Formed from the Lipoic Acid Ester of α-Hydroxy-1-acetylpyrene: The Generality of Acid-Catalyzed Removal of Thiol-on-Gold SAMs using Soft UV Light

摘要: Under a layer of 0.1 M HCl in isopropanol, soft ultraviolet (UV) (365 nm) photolysis the thiol-on-gold self-assembled monolayer (SAM) derived from lipoic acid ester α-hydroxy-1-acetylpyrene results expected removal acetylpyrene protecting group. When photolyzing through mask, this can be used to produce patterned surface and, at controlled electrochemical potential, it is then possible selectively and reversibly electrodeposit copper on photolyzed regions. Rather surprisingly, under these conditions, there not only photodeprotection but also partial which has been formed. In further studies, shown that type acid-catalyzed photoremoval SAM layers by UV rather general phenomenon other ω-thiolated carboxylic acids. However, chain-length dependent. conditions the...