作者: Maria M. Giangregorio , Maria Losurdo , Marianna Ambrico , Pio Capezzuto , Giovanni Bruno
DOI: 10.1063/1.2180407
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摘要: Crystallization of hydrogenated amorphous germanium (a‐Ge:H) thin films deposited by plasma enhanced chemical vapor deposition using the GeH4 and H2 precursors has been investigated. A comparative analysis kinetics thermal crystallization annealing to 650°C gold-mediated (Au-MMC) is carried out. The impact Au-MMC on microcrystalline Ge film microstructure electrical properties discussed. Au layer results in a more dense ordered structure with lower roughness films. In order describe kinetics, dielectric functions a‐Ge:H μc‐Ge have also determined spectroscopic ellipsometry range 0.75−6.0eV parametrized Tauc-Lorentz dispersion equation.