Gas distribution system with tuning gas
作者： Babak Kadkhodayan , William M. Denty , Peter Loewenhardt , Xingcai Su , Bi-Ming Yen
DOI:
关键词:
摘要: An apparatus for providing different gases to zones of a processing chamber is provided. A gas supply an etching flow splitter in fluid connection with the splitting from into plurality legs tuning system at least one
google.com.tr 参考文章(83)
Eric Serdahl, Craig Esser, John N. Gregg, Robert M. Jackson, Chemical delivery and containment system employing mobile shipping crate ,(1999)
Akira Fukunaga, Kaori Miyoshi, Shyuhei Shinozuka, Yoichi Kobayashi, Gas polishing apparatus and method ,(1999)
Tomohiro Nakamori, Hitoshi Abe, Metalorganic chemical vapor deposition of superconducting films ,(1990)
Mehrdad M. Moslehi, Apparatus and method for multi-zone high-density inductively-coupled plasma generation ,(2000)
Vicky Nguyen, Lawrence Lei, Avgerinos Gelatos, Yin Lin, Fong Chang, Joel Huston, Method and apparatus for tuning a plurality of processing chambers ,(2001)
Yoichiro Sakachi, Tetsuo Saito, Hironori Nishino, Satoshi Murakami, Kenji Maruyama, Apparatus for growing group II-VI mixed compound semiconductor ,(1994)
Dennis C. Swartz, Vacuum processing chamber with controlled gas supply valve ,(2000)
Kyung Cheol Jeong, Gas distribution system and method for chemical vapor deposition apparatus ,(1996)
Eric J. Strang, Method of and apparatus for tunable gas injection in a plasma processing system ,(2002)
Harald Herchen, Michael Welch, Hongching Shan, Distributed microwave plasma reactor for semiconductor processing ,(1995)