Ionogram analysis: Least squares fitting of a Chapman‐layer peak

作者: J. E. Titheridge

DOI: 10.1029/RS020I002P00247

关键词:

摘要: A formulation is described which uses plasma frequency F as a function of real height h near layer peak. This allows profile data from lower heights, and scaled critical frequencies both magnetoionic components, to be combined in single least squares solution. The do not define the final value, but provide additional input calculation. Results give directly rms fitting errors for frequency, peak scale height. Calculations begin with an assumed model value With good result independent this model. As amount consistency decreases, solution automatically gives more weight initial (model) greatly reduces normal tendency extrapolations become erratic or absurd quality decreases. very poor imposed directly. still obtained solution, using known plus some physical checks ensure reasonable range extrapolation. Thus optimum results are data, acceptable profiles all useful ionograms.

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