Radiation system and lithographic apparatus
作者： Vadim Yevgenyevich Banine , Vladimir Mihailovitch Krivtsun , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov
DOI:
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摘要: A radiation system (1) for generating a beam of (2) that defines an optical axis (3) is provided. The includes plasma produced discharge source (4) EUV radiation. pair electrodes (5) constructed and arranged to be provided with voltage difference, producing between the so as provide (7) in (5). also debris catching shield (11) (8) from line sight predetermined spherical angle relative (3), aperture (12) central area (10) sight.
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