Substrate reactor with adjustable injectors for mixing gases within reaction chamber
作者： Ravinder Aggarwal , Rand Conner , James A. Alexander , John Disanto
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摘要: Methods and apparatuses for separately injecting gases into a reactor substrate processing system. The flow profiles of the are controlled with two or more sets adjustable gas injectors. methods particularly useful selective deposition in CVD system using volatile combinations precursors etchants. In either case, provided along separate paths that intersect relatively open reaction space, rather than confined upstream locations.
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